Tài liệu tham khảo |
Loại |
Chi tiết |
[2] R. C. Y. Fang, R. D. Rung, and K. M. Cham, ‘An improved automatic test system for VLSI parameteric testing’, IEEE Trans. Instrumentation and Measurement, [3] B. S. Messenger, ‘A fully automated M O S device characterization system for process-oriented integrated circuit design’, Memorandum No. UCB/ERL M84/18, Electronic Research Laboratory, University of California, Berkeley, January 1984 |
Sách, tạp chí |
Tiêu đề: |
An improved automatic test system for VLSI parameteric testing |
Tác giả: |
R. C. Y. Fang, R. D. Rung, K. M. Cham |
Nhà XB: |
IEEE Trans. Instrumentation and Measurement |
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[4] 0. Melstrand, E. ONeill, G. E. Sobelman, and D. Dokos, ‘A data base driven automated system for MOS device characterization, parameter optimization and modeling’, IEEE Trans. Computer-Aided Design, CAD-3, pp. 47-51 (1984) |
Sách, tạp chí |
Tiêu đề: |
A data base driven automated system for MOS device characterization, parameter optimization and modeling |
Tác giả: |
E. ONeill, G. E. Sobelman, D. Dokos |
Nhà XB: |
IEEE Trans. Computer-Aided Design |
Năm: |
1984 |
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[5] E. Khalily, P. H. Decher, and D. A. Teegarden, ‘TECAP2 An interactive device characterization and model development system’, Tech. Digest, IEEE Int. Conf. on Computer-Aided Design, ICCAD-84, pp. 184-151 (1984) |
Sách, tạp chí |
Tiêu đề: |
TECAP2 An interactive device characterization and model development system |
Tác giả: |
E. Khalily, P. H. Decher, D. A. Teegarden |
Nhà XB: |
IEEE Int. Conf. on Computer-Aided Design |
Năm: |
1984 |
|
[7] D. Cheung, A. Clark, and R. Starr, ‘The INMOS integrated parameteric test and analysis system’, Proc. IEEE Int. Conf. on Microelectronic Test Structures, Vol. 2, No. 1, pp. 45-50, March 1989.181 Operation and Service Manual for Model 4145B Semiconductor Parameter Analyzer, Hewlett Packard Corporation, USA, 1986 |
Sách, tạp chí |
Tiêu đề: |
The INMOS integrated parameteric test and analysis system |
Tác giả: |
D. Cheung, A. Clark, R. Starr |
Nhà XB: |
Proc. IEEE Int. Conf. on Microelectronic Test Structures |
Năm: |
1989 |
|
References 495 [127 N. S. Sakas, P. L. Heremans, L. Van Den Hove, H. E. Maes, R. F. De Keersmaecker, and G. J. Declerck, ‘Observation of hot-hole injection in NMOS transistors using a modified floating-gate technique’, IEEE Trans. Electron Devices, ED-33, pp. 1529- 1533 (1986) |
Sách, tạp chí |
Tiêu đề: |
Observation of hot-hole injection in NMOS transistors using a modified floating-gate technique |
Tác giả: |
N. S. Sakas, P. L. Heremans, L. Van Den Hove, H. E. Maes, R. F. De Keersmaecker, G. J. Declerck |
Nhà XB: |
IEEE Trans. Electron Devices |
Năm: |
1986 |
|
[16] E. H. Nicollian and J. R. Brews, ‘Instrumentation and analog implementation of Q-C method of MOS measurement’, Solid-state Electron., 27, pp. 953-962 (1984). See also related papers, ibid, pp. 963-975 and pp. 977-988 (1984) |
Sách, tạp chí |
Tiêu đề: |
ibid |
Tác giả: |
E. H. Nicollian and J. R. Brews, ‘Instrumentation and analog implementation of Q-C method of MOS measurement’, Solid-state Electron., 27, pp. 953-962 |
Năm: |
1984 |
|
[18] K. Iniewski, A. Balasinski, B. Majkusiak, R. B. Beck, and A. Jakubowski, ‘Series resistance in a MOS capacitor with a thin gate oxide’, Solid-state Electron., 32, pp. 137-140 (1989).[ 191 K. Riedling, Ellipsometry for Industrial Applications, Springer-Verlag, New York, 1988 |
Sách, tạp chí |
Tiêu đề: |
Ellipsometry for Industrial Applications |
Tác giả: |
K. Iniewski, A. Balasinski, B. Majkusiak, R. B. Beck, and A. Jakubowski, ‘Series resistance in a MOS capacitor with a thin gate oxide’, Solid-state Electron., 32, pp. 137-140 |
Năm: |
1989 |
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[6] K. Doganis and S. Hailey, ‘A unified physical device modeling environment’, IEEE 1986 Custom Integrated Circuit Conference, pp. 203-207 (1986) |
Khác |
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[17] M. Kuhn, ‘A quasi-static technique for MOS C-V and surface state measurements’, Solid-state Electron., 13, pp. 873-885 (1970) |
Khác |
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